Plasma‐promoted deposition of thin inorganic films-Reference-Cited by-同舟云学术

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Plasma‐promoted deposition of thin inorganic films

Published:1979-03 Issue:2 Volume:16 Page:420-427
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Rand Myron J.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.569965

Cited by 76 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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