Plasmas and Plasma Enhanced CVD-Reference-Cited by-同舟云学术

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Plasmas and Plasma Enhanced CVD

Published:2018 Issue: Volume: Page:61-86
ISSN:
Container-title:The Foundations of Vacuum Coating Technology
language:
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Author:

Mattox Donald M.

Publisher

Elsevier

Reference227 articles.

1. Glow Discharge Processes: Sputtering and Etching;Chapman,1980

2. An overview of plasma processes, Ch. 13;Walton,2007

3. Oscillations in ionized gases;Langmuir;Proc. Natl. Acad. Sci.,1928

4. Oscillations in ionized gases;Tonks;Phys. Rev,1929

5. Cold Plasmas in Materials Fabrication: From Fundamentals to Applications;Grill,1994

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanocomposites Thin Films: Manufacturing and Applications;Nanocomposite Materials for Biomedical and Energy Storage Applications;2022-11-02

2. Chemical vapor deposition and its application in surface modification of nanoparticles;Chemical Papers;2019-10-18

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