A Study of the Rapid Thermal Annealing Process for PECVD-Deposited Borophosphosilicate Glass-Reference-Cited by-同舟云学术

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A Study of the Rapid Thermal Annealing Process for PECVD-Deposited Borophosphosilicate Glass

Published:2008-05-15 Issue:3-4 Volume:5 Page:281-294
ISSN:0969-1855
Container-title:Developments in Chemical Engineering and Mineral Processing
language:en
Short-container-title:Dev. Chem. Eng. Mineral Process.

Author:

Naimpally A.

Publisher

Wiley

Subject

Geology,General Chemical Engineering

Reference21 articles.

1. Kern , W Schnable , G. L. 1982

2. Deposition of CVD BPSG filmed and reflow mechanisms.;Tiangling;Chinese Semiconductor,1985

3. Kern , W. Kurylo , W. A. Tino , C. J. 1985 RCA Review 117 152

4. Advanced APCVD for thin film deposition.;Gralenski;Microelectronics Manufacturing and Testing,1987

5. Gralenski , N. 1988 2

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