Scatterometry for nanoimprint lithography-Reference-Cited by-同舟云学术

Scatterometry for nanoimprint lithography

Published:2016-11 Issue:6 Volume:34 Page:06K503
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Zhu Ruichao,Brueck Steven R. J.,Dawson Noel,Busani Tito,Joseph Praveen,Singhal Shrawan,Sreenivasan S. V.

Funder

National Science Foundation (NSF)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://scitation.aip.org/deliver/fulltext/avs/journal/jvstb/34/6/1.4967933.pdf?itemId=/content/avs/journal/jvstb/34/6/10.1116/1.4967933&mimeType=pdf&containerItemId=content/avs/journal/jvstb

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of porosity in periodic 3D nanostructures using spectroscopic scatterometry;Journal of Vacuum Science & Technology B;2023-10-06

2. Nanoscale limits of angular optical scatterometry;AIP Advances;2020-01-01

3. Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication;Journal of Vacuum Science & Technology B;2019-09

4. Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy;Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019;2019-03-26

5. Metrology and inspection required for next generation lithography;Japanese Journal of Applied Physics;2017-04-24