Effect of Discharge Properties of the Oxide High Barrier Film Deposited by Roll-to-Roll MF-PECVD
Author:
Publisher
Springer Nature Singapore
Link
https://link.springer.com/content/pdf/10.1007/978-981-99-1576-7_7
Reference21 articles.
1. Lee, S., Han, J.-H., Lee, S.-H., Baek, G.-H., Park, J.-S.: Review of organic/inorganic thin film encapsulation by atomic layer deposition for a flexible OLED display. JOM 71(1), 197–211 (2018)
2. Park, K.W., et al.: High-performance thin H:SiON OLED encapsulation layer deposited by PECVD at low temperature. RSC Adv. 9(1), 58–64 (2018)
3. Shin, S., Yoon, H.W., Jang, Y., Hong, M.: Stoichiometric silicon nitride thin films for gas barrier, with applications to flexible and stretchable OLED encapsulation. Appl. Phys. Lett. 118(18), 181901 (2021)
4. Wu, J., et al.: Efficient multi-barrier thin film encapsulation of OLED using alternating Al2O3 and polymer layers. RSC Adv. 8(11), 5721–5727 (2018)
5. Bari, G.A.K.M.R., Kim, H.: High-barrier polymeric multilayer film with organic and interactive materials. Prog. Org. Coat. 147, 105814 (2020)
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3