Stoichiometric silicon nitride thin films for gas barrier, with applications to flexible and stretchable OLED encapsulation
Author:
Affiliation:
1. Department of Applied Physics, Korea University, 2511 Sejong-ro, Sejong 30019, South Korea
2. Stretchable Display Research Center, Korea University, 2511 Sejong-ro, Sejong 30019, South Korea
Funder
Korea Institute of Energy Technology Evaluation and Planning
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0050836
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1. Highly Robust Transparent and Conductive Gas Diffusion Barriers Based on Tin Oxide
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