登录 注册 会员服务 联系我们

On treatment of ultra-low-k SiCOH in CF4 plasmas: correlation between the concentration of etching products and etching rate

  • Published:2015-03-07 Issue:1 Volume:119 Page:219-226
  • ISSN:0946-2171
  • Container-title:Applied Physics B
  • language:en
  • Short-container-title:Appl. Phys. B

Author:

Lang N.,Zimmermann S.,Zimmermann H.,Macherius U.,Uhlig B.,Schaller M.,Schulz S. E.,Röpcke J.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A simple analytical model to describe time-resolved concentrations of plasma species;2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM);2023-05

2. Simultaneous detection of CF4 and SIF4 using external cavity quantum cascade laser absorption spectroscopy;Applied Physics B;2022-06-18

3. On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes;AIP Advances;2020-06-01

4. Cp2Mg in-situ monitoring in a MOVPE reactor using a quantum cascade laser;Japanese Journal of Applied Physics;2019-05-01

5. Instrumentation and Applications of Cascade Laser Spectroscopy;Encyclopedia of Analytical Chemistry;2018-09-12
同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3