Publisher
Springer Berlin Heidelberg
Reference28 articles.
1. R. M. Martin: Electronic Structure: Basic Theory and
Practical Methods (Cambridge Univ. Press, Cambridge 2004)
2. S. D. Elliott: First principles modelling of the deposition process for high-k
dielectric films, Electrochem. Soc. Proc. 2003-14, 231 (2003)
3. A. Y. Timoshkin, H. F. Bettinger, H. F. Schaefer, III: The chemical vapor
deposition of aluminium nitride: unusual cluster formation in the gas phase,
J. Am. Chem. Soc. 119, 5668–5678 (1997)
4. A. Y. Timoshkin, H. F. Bettinger, H. F. Schaefer, III: DFT modeling of
chemical vapor deposition of GaN from organogallium precursors. 1.
Thermodynamics of elimination reactions, J. Phys. Chem. A 105, 3240–3248 (2001)
5. S. D. Elliott, J. C. Greer: Simulating the atomic layer deposition of alumina
from first principles, J. Mater. Chem. 14,
3246–3250 (2004)
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