Applications of atomic layer chemical vapor deposition for the processing of nanolaminate structures
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Chemical Engineering,General Chemistry
Link
http://link.springer.com/content/pdf/10.1007/BF02697156.pdf
Reference98 articles.
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2. Aarik, J., Aidla, A., Kiisler, A., Uustare, T. and Sammelselg, V., “Influence of Substrate Temperature on Atomic Layer Growth and Properties of HfO2 Thin Film”,Thin Solid Films,340, 110 (1999).
3. Aarik, J., Aidla, A., Mandar, M., Uustare, T., Kukli, K. and Schuisky, M., “Phase Transformations in Hafnium Dioxide Thin Films Grown by Atomic Layer Deposition at High Temperatures”,Applied Surface Science,173, 15 (2001).
4. Aarik, J., Aidla, A., Mandar, H. and Uustare, T., “Atomic Layer Deposition of Titanium Dioxide from TiCl4 and H2O: Investigation of Growth Mechanism”,Applied Surface Science,172, 148 (2001).
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