Laser-induced chemical etching of silicon in chlorine atmosphere-Reference-Cited by-同舟云学术

Laser-induced chemical etching of silicon in chlorine atmosphere

Published:1988-12 Issue:4 Volume:47 Page:377-386
ISSN:0721-7250
Container-title:Applied Physics A: Solids and Surface
language:en
Short-container-title:Appl. Phys. A

Author:

Kullmer R.,Bäuerle D.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00615502.pdf

Reference14 articles.

1. R. Kullmer, D. Bäuerle: Appl. Phys. A43, 227 (1987)

2. Y. Horiike, N. Hayasaka, M. Sekine, T. Arikado, M. Nakase, H. Okano: Appl. Phys. A44, 313 (1987)

3. P. Mogyorósi, K. Piglmayer, R. Kullmer, D. Bäuerle: Appl. Phys. A45, 293 (1988)

4. 1;D. Bäuerle,1986

5. D. Bäuerle, M. Eyett, U. Kolzer, R. Kullmer, P. Mogyorósi, K. Piglmayer: InLaser- and Particle-Beam Chemical Processing for Microelectronics, ed. by D.J. Ehrlich, G.S. Higashi, M.M. Oprysko (Mat. Res. Soc. Symp. 1987)

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