Laser-induced chemical etching of silicon in chlorine atmosphere-Reference-Cited by-同舟云学术

Laser-induced chemical etching of silicon in chlorine atmosphere

Published:1987-07 Issue:3 Volume:43 Page:227-232
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Kullmer R.,B�uerle D.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00615982.pdf

Reference26 articles.

1. Springer Ser. Mat. Sci.;D. Bäuerle,1986

2. D.J. Ehrlich, R.M. Osgood, T.F. Deutsch: Appl. Phys. Lett.38, 1018 (1981)

3. H. Okano, Y. Horiike, M. Sekine: Jpn. J. Appl. Phys.24, 68 (1985)

4. T. Arikado, M. Sekine, H. Okano, Y. Horiike: InLaser Controlled Chemical Processing of Surfaces, ed. by A.W. Johnson, D.J. Ehrlich, H.R. Schlossberg (North-Holland, New York 1984) p. 167

5. 39;T.J. Chuang,1984

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