Excimer-laser etching on silicon-Reference-Cited by-同舟云学术

Excimer-laser etching on silicon

Published:1987-12 Issue:4 Volume:44 Page:313-322
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Horiike Y.,Hayasaka N.,Sekine M.,Arikado T.,Nakase M.,Okano H.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00624598.pdf

Reference26 articles.

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3. Extended Abstracts, Laser Chemical Processing of Semiconductor Devices, ed. by F.A. Houle, T.F. Deutsch, R.M. Osgood, Jr. (Mat. Res. Soc., Pittsburgh 1986) pp. 3?134

4. H. Okano, Y. Horiike, M. Sekine: Jpn. J. Appl. Phys.24, 68 (1985)

5. Y. Horiike, M. Sekine, K. Horioka, T. Arikado, H. Okano: Extended Abstracts of 16th Conf. onSol.St. Dev. and Mat. 441 (1984)

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