Quality control for deep x-ray lithography (LIGA): a preliminary metrology study

Author:

Meyer Pascal,Claverley James D.,Leach Richard K.

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Bos EJC (2008) Tactile 3D probing system for measuring MEMS with nanometer uncertainty. Dissertation, Technical University Eindhoven

2. Bosse H, Koenders L, Härtig F, Buhr E, Wilkening G (2010) Nano and micrometrology at PTB: state of the art and future challenges. Optolectron Instr Data Proc 46(4):312–317

3. Griffiths SK (2004) Fundamental limitations of LIGA x-ray lithography: sidewall offset, slope and minimum feature size. J Micromech Microeng 14:999–1011

4. ISO 10360-2 (2009) Co-ordinate Metrology—Part 2: performance assessment of co-ordinate measuring machines. ISO, Geneva

5. ISO 12181-2 (2003) Geometrical Product Specifications (GPS)—roundness—Part 1: vocabulary and parameters of roundness. ISO, Geneva

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