1. J. W. Mayer, L. Eriksson and J. A. Davies, “Ion implantation in semiconductors. Si and Ge.” Académic press, inc., New York (1970).
2. L. C. Kimerling and J. L. Benton, “Laser and électron beam processing of materials,” Académic press., inc., New York, 385 (1980).
3. K. L. Wang, Y. S. Liu, G. E. Possin, J. Karins, Jr., and J. Corbett, J. Appl. Phys. 54, N7 (1983).
4. J. Lindhard, M. Scharff and H. E. Schott, Kgl. dan. vidensk. sesk. fys. mat. medd. 33, 14 (1963).
5. D. V. Lang, J. Appl. Phys. 45, 3023 (1974).