A new Vertical C-shaped Silicon Channel Nanosheet FET with Stacked High-K Dielectrics for Low Power Applications
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Publisher
Springer Science and Business Media LLC
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https://link.springer.com/content/pdf/10.1007/s12633-024-02871-7.pdf
Reference38 articles.
1. Liu H, Neal AT, Ye PD (2012) Channel length scaling of MoS 2 MOSFETs. ACS Nano 6:8563–8569. https://doi.org/10.1021/nn303513c
2. Kim S, Lee K, Kim S, Kim M, Lee JH, Kim S, Park BG (2022) Investigation of device performance for fin angle optimization in FinFET and gate-all-around FETs for 3 nm-node and beyond. IEEE Trans Electron Dev 69:2088–2093. https://doi.org/10.1109/TED.2022.3154683
3. Sachid AB, Chen MC, Hu C (2017) Bulk FinFET with low-κ spacers for continued scaling. IEEE Trans Electron Dev 64:1861–1864. https://doi.org/10.1109/TED.2017.2664798
4. Yu E, Heo K, Cho S (2018) Characterization and optimization of inverted-T FinFET under nanoscale dimensions. IEEE Trans Electron Dev 65:3521–3527. https://doi.org/10.1109/TED.2018.2846478
5. Niimi H, Liu Z, Gluschenkov O, Mochizuki S, Fronheiser J, Li J, Demarest J, Zhang C, Liu B, Yang J, Raymond M, Haran B, Bu H, Yamashita T (2016) Sub-10-9 Ω-cm2 n-type contact resistivity for FinFET technology. IEEE Electron Device Lett 37:1371–1374. https://doi.org/10.1109/LED.2016.2610480
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