Effect of Ge Mole Fraction on Electrical Parameters of Si1−xGex Source Step-FinFET and its Application as an Inverter
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/article/10.1007/s12633-018-9846-8/fulltext.html
Reference36 articles.
1. Roy K, Mukhopadhyay S, Meimand HM (2003) Leakage current mechanisms and leakage reduction techniques in deep-submicrometer CMOS circuits. Proc IEEE 91(2):305–327. https://doi.org/10.1109/JPROC.2002.808156
2. Yeo YC, King TJ, Hu C (2003) MOSFET gate leakage modeling and selection guide for alternative gate dielectrics based on leakage considerations. IEEE Trans Electron Dev 50(4):1027–1035. https://doi.org/10.1109/TED.2003.812504
3. Poiroux T, Vinet M, Faynet O, Widiez J, Lolvier J, Previtali B, Ernst T, Deleonibus S (2006) Multigate silicon MOSFETs for 45 nm node and beyond. Solid-State Electron 50:18–23. https://doi.org/10.1016/j.sse.2005.10.049
4. Orouji AA, Rahimian M (2012) Leakage current reduction in nanoscale fully-depleted SOI MOSFETs with modified current mechanism. Curr Appl Phys 12:1366–1371. https://doi.org/10.1016/j.cap.2012.03.029
5. Bhattacharya D, Jha N K (2014) FinFETs: from devices to architectures. Hindawi Publishing Corporation, Advances in Electronics, Article ID 365689, 21pp. https://doi.org/10.1155/2014/365689
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