Silicon Wafer Surface-Temperature Monitoring System for Plasma Etching Process-Reference-Cited by-同舟云学术

Silicon Wafer Surface-Temperature Monitoring System for Plasma Etching Process

Published:2011-06-12 Issue:7-8 Volume:32 Page:1457-1466
ISSN:0195-928X
Container-title:International Journal of Thermophysics
language:en
Short-container-title:Int J Thermophys

Author:

Yamada Y.,Ishii J.,Nakaoka A.,Mizojiri Y.

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/s10765-011-1016-9.pdf

Reference7 articles.

1. International Technology Roadmap for Semiconductors: 2009 Edition: Front End Processes. Available at http://www.itrs.net/Links/2009ITRS/2009Chapters_2009Tables/2009_FEP.pdf

2. Hatori K., Taketoshi N., Baba T., Ohta H.: Rev. Sci. Intrum. 76, 114901 (2005)

3. Lee A.S., Norris P.M.: Rev. Sci. Instrum. 68, 1307 (1996)

4. A.S. Lee, P.M. Norris, in Proceedings of National Heat Transfer Conference 5, HTD-vol. 327 (1996), pp. 41–46

5. R.M. Azzam, N.M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977)

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Real-Time In Situ Wafer Temperature Measurement System Based on Fiber Bragg Grating Array;IEEE Sensors Journal;2024-06-01

2. Wafer Temperature Control Using Helium Pressure and Observer-Based Model Predictive Control;ASME Letters in Dynamic Systems and Control;2023-07-01

3. Thermoreflectance temperature measurement with millimeter wave;Review of Scientific Instruments;2014-06

4. Evaluation of methods for determining food surface temperature in the presence of low-pressure cool plasma;Innovative Food Science & Emerging Technologies;2012-07

5. In situ Silicon-Wafer Surface-Temperature Measurements Utilizing Polarized Light;International Journal of Thermophysics;2011-09-10