A new optical method for measuring surface temperature at large incident probe angles
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1147889
Reference12 articles.
1. Photothermal measurements on optical thin films
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5. Simultaneous Silicon Wafer Temperature and Oxide Film Thickness Measurement in Rapid‐Thermal Processing Using Ellipsometry
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2. Electron beam induced changes in the reflectance of materials;Journal of Physics: Conference Series;2014-11-24
3. Silicon Wafer Surface-Temperature Monitoring System for Plasma Etching Process;International Journal of Thermophysics;2011-06-12
4. An optical method for measuring metal surface temperature in harsh environment conditions;Optical Sensing and Detection;2010-04-30
5. Chapter 7 Laser Optical and Photothermal Thermometry of Solids and Thin Films;Experimental Methods in the Physical Sciences;2009
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