Core/Shell Structured Solid-Silica/Mesoporous-Silica Microspheres as Novel Abrasives for Chemical Mechanical Polishing-Reference-Cited by-同舟云学术

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Core/Shell Structured Solid-Silica/Mesoporous-Silica Microspheres as Novel Abrasives for Chemical Mechanical Polishing

Published:2015-04-21 Issue:3 Volume:58 Page:
ISSN:1023-8883
Container-title:Tribology Letters
language:en
Short-container-title:Tribol Lett

Author:

Chen Yang,Wang Yayun,Qin Jiawei,Chen Ailian

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanical Engineering,Mechanics of Materials

Link

http://link.springer.com/content/pdf/10.1007/s11249-015-0513-6.pdf

Reference26 articles.

1. Thomas, E.L.H., Nelson, G.W., Mandal, S.J.S., Foord, O.A.: Williams, Chemical mechanical polishing of thin film diamond. Carbon 68, 473–479 (2014)

2. Xin, J., Cai, W., Tichy, J.A.: A fundamental model proposed for material removal in chemical–mechanical polishing. Wear 268, 837–844 (2010)

3. Lee, H., Joo, S., Jeong, H.: Mechanical effect of colloidal silica in copper chemical mechanical planarization. J. Mater. Process. Technol. 209, 6134–6139 (2009)

4. Pan, G., Gu, Z., Zhou, Y., Li, T., Gong, H., Liu, Y.: Preparation of silane modified SiO2 abrasive particles and their chemical mechanical polishing (CMP) performances. Wear 273, 100–104 (2011)

5. Penta, N.K., Peethala, B.C., Amanapu, H.P., Melman, A., Babu, S.V.: Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions. Colloids Surf. A 429, 67–73 (2013)

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1. Performance of flexible CeO2 composite abrasive in force rheological polishing of fused silica glass;Journal of Manufacturing Processes;2024-09

2. Enhancement mechanism of Y-doped Ce1−xYxO2 for photocatalytic-assisted chemical-mechanical polishing;Materials Today Communications;2024-03

3. Controllable synthesis of core-shell SiO2@CeO2 abrasives for chemical mechanical polishing on SiO2 film;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2024-02

4. A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics;Nanoscale;2024

5. Development and characterization of a novel RE3+ doped Core-shell CeO2 abrasive system and its glass CMP investigations;Applied Surface Science;2023-11

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