The copolymer of methyl methacrylate and methacrylic acid as a sensitive resist for deep-etch X-ray lithography-Reference-Cited by-同舟云学术

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The copolymer of methyl methacrylate and methacrylic acid as a sensitive resist for deep-etch X-ray lithography

Published:1996-05 Issue:2 Volume:2 Page:46-49
ISSN:0946-7076
Container-title:Microsystem Technologies
language:en
Short-container-title:Microsystem Technologies

Author:

Numazawa T.,Hirata Y.,Takada H.

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02447749.pdf

Reference7 articles.

1. Ehrfeld W.;Bley P.;Gotz F.;Mohr J.;Munchmeyer D.;Schelb W. (1988) Progress in deep-etch synchrotron radiation lithography. J. Vac. Sci. Technol. B6, 178–182

2. Ehrfeld W.;Munchmeyer D. (1991) Three dimensional microfabrication using synchrotron radiation, Nucl. Instr. and Meth. in. Phys. Res. A303, 523–531

3. Haller I.;Feder R.;Hatzakis M.;Spiller E. (1979) Copolymer of methyl methacrylate and methacrylic acid and their metal salts as radiation sensitive resists. J. Electrochem. Soc. 126(1), 154–161

4. Hirata Y.; Okuyama H.; Ogino S.; Numazawa T.; Takada H. (1995) Piezoelectric composites for micro-ultrasonic transducers realized-with deep-etch X-ray lithography. Proc. IEEE Micro Electro Mechanical Systems Workshop. 191–196

5. Mohr J.;Ehrfeld W.;Munchmeyer D. (1988) Requirement on resist layers in deep-etch synchrotron radiation lithography. J. Vac. Sci. Technol. B6 (6), 2264–2267

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4. 微細加工技術を革新するマイクロモールド技術の極限;Seikei-Kakou;1999-12-20

5. Development of microconnector with automatic connecting/disconnecting mechanism;Technical Digest. IEEE International MEMS 99 Conference. Twelfth IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.99CH36291);1999

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