LIGA process – micromachining technique using synchrotron radiation lithography – and some industrial applications
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. Development of LIGA process using a superconducting compact synchrotron light source
2. Requirements on resist layers in deep-etch synchrotron radiation lithography
3. Three-dimensional microfabrication using synchrotron radiation
4. The copolymer of methyl methacrylate and methacrylic acid as a sensitive resist for deep-etch X-ray lithography
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