SU8 resist for low-cost X-ray patterning of high-resolution, high-aspect-ratio MEMS-Reference-Cited by-同舟云学术

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SU8 resist for low-cost X-ray patterning of high-resolution, high-aspect-ratio MEMS

Published:2002-01 Issue:1-2 Volume:33 Page:101-105
ISSN:0026-2692
Container-title:Microelectronics Journal
language:en
Short-container-title:Microelectronics Journal

Author:

Khan Malek Chantal G

Publisher

Elsevier BV

Subject

General Engineering

Reference22 articles.

1. Fabrication of high depth-to-width aspect ratio microstructures;Engelmann;Proc. IEEE Micro-Electro-Mech.-Syst.,1992

2. Micromachining applications of a high resolutyion utrathick photoresist;Lee;J. Vac. Sci. Technol. B,1995

3. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS;Despont;Sensors Actuators A,1998

4. Characterization of ultra-thick photoresist for MEMS applications using a 1X stepper;Flack;SPIE Proc.,1998

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3. A method to fabricate high-aspect-ratio microstructures using PMMA photoresist;Microsystem Technologies;2017-07-17

4. Effects of Residual Solvent Molecules Facilitating the Infiltration Synthesis of ZnO in a Nonreactive Polymer;Chemistry of Materials;2017-05-11

5. Electron beam lithography in thick negative tone chemically amplified resist: Controlling sidewall profile in deep trenches and channels;Microelectronic Engineering;2014-11

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