Principles and Applications of a Dual Primary Ion Source and Mass Filter for an Ion Microanalyser-Reference-Cited by-同舟云学术

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Principles and Applications of a Dual Primary Ion Source and Mass Filter for an Ion Microanalyser

Published:1982 Issue: Volume: Page:52-56
ISSN:0172-6218
Container-title:Secondary Ion Mass Spectrometry SIMS III
language:
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Author:

Le Goux J. J.,Migeon H. N.

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/978-3-642-88152-7_7

Reference2 articles.

1. J.M. Gourgout, in Secondary Ion Mass Spectrometry II, ed. By A. Benninghoven, C.A. Evans, Jr., R.A. Powell, R. Shimuzu, H.A. Storms, Springer Series in Chemical Physics, Vol. 9 ( Springer, Berlin,Heidelberg,New York 1979 ) p. 286 - 290

2. P. Williams, R.K. Lewis, C.A. Evans and P.R. Hanley, Anal. Chem. 49, 1499 (1977)

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1. High dynamic range SIMS depth profiling onin situ ion-beam-generated mesas using the ion microscope;Surface and Interface Analysis;1992-11

2. Surface and depth analysis based on sputtering;Topics in Applied Physics;1991

3. Optimization of the dynamic range of SIMS depth profiles by sample preparation;Surface and Interface Analysis;1990-07

4. A SIMS calibration exercise using multi-element (Cr, Fe and Zn) implanted GaAs;Surface and Interface Analysis;1987-09

5. In Situ Ion Implantation for Quantitative SIMS Analysis;MRS Proceedings;1985

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