Electrical characteristics of metal–insulator–semiconductor and metal–insulator–semiconductor–insulator–metal capacitors under different high-k gate dielectrics investigated in the semi-classical and quantum mechanical models
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanics of Materials,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s12034-016-1341-5.pdf
Reference40 articles.
1. Lo S H, Buchanan D A, Taur Y et al 1997, IEEE Electron. Device Lett. 18 209
2. Mikhelashvili V, Thangadurai P, Kaplan W D et al 2010, Microelectron. Eng. 87 1728
3. Nguyen T, Busseret C, Militaru L et al 2007, Microelectron. Reliab. 47 729
4. Turut A, Karabulut A, Ejderha K et al 2015, Mater. Sci. Semicond. Process. 39 400
5. Khairnar A G and Mahajan A M 2013 Bull. Mater. Sci. 36 259
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