Abstract
Abstract
In this paper, we analyze the gate capacitance of a MOSFET (Metal–Oxide–Semiconductor Field-Effect Transistor) and propose a method of realizing the capacitance less dependent on the gate voltage. We analyze the mechanism of capacitance formation in the cases of short-circuiting the source and drain to the ground and floating them. The analysis also reveals the influence of channel length on gate capacitance. By floating the terminals of source and drain and tuning for an optimum channel length, the voltage dependence of the gate capacitance can be largely reduced. Simulation results verify our analysis, suggesting a possibility of applying a MOSFET capacitor for sample-and-hold circuits in analog-to-digital converters.
Funder
Japan Science and Technology Agency, Adaptable and Seamless Technology Transfer Program through Target-Driven R and D
Japan Society for the Promotion of Science, KAKENHI
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
2 articles.
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