Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition-Reference-Cited by-同舟云学术

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Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition

Published:2002-12 Issue:12 Volume:31 Page:1341-1346
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Ting Shyh-Fann,Fang Yean-Kuen,Hsieh Wen-Tse,Tsair Yong-Shiuan,Chang Cheng-Nan,Lin Chun-Sheng,Hsieh Ming-Chun,Chiang Hsin-Che,Ho Jyh-Jier

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-002-0119-2.pdf

Reference15 articles.

1. C.H. Hsieh, Y.S. Huang, K.K. Tiong, C.W. Fan, Y.F. Chen, L.C. Chen, J.J. Wu, and K.H. Chen, J. Appl. Phys. 87, 280 (2000).

2. D.M. Bhusari, C.K. Chen, K.H. Chen, T.J. Chuang, L.C. Chen, and M.C. Lin, J. Mater. Res. 12, 322 (1997).

3. K.H. Chen, J.J. Wu, C.Y. Wen, L.C. Chen, C.W. Fan, P.F. Kuo, Y.F. Chen, and Y.S. Huang, Thin Solid Films 355–356, 205 (1999).

4. X.C. Xiao, Y.W. Li, L.X. Song, X.F. Peng, and X.F. Hu, Appl. Surf. Sci. 156, 155 (2000).

5. W.T. Hsieh, Y.K. Fang, K.H. Wu, W.J Lee, and C.W. Ho, IEEE Trans. Electron. Dev. 48, 801 (2001).

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