Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar-Reference-Cited by-同舟云学术

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Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

Published:2000-02 Issue:1-4 Volume:156 Page:155-160
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Xiao Xing-cheng,Li Ya-wen,Song Li-xin,Peng Xiao-feng,Hu Xing-fang

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference18 articles.

1. Prediction of New Low Compressibility Solids

2. Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4

3. Experimental Realization of the Covalent Solid Carbon Nitride

4. Superhard and Elastic Carbon Nitride Thin Films Having Fullerenelike Microstructure

5. SiCN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition

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