Room-Temperature Preparation of High-Transparency Low-Resistivity ITO Films by Ion Beam Sputtering-Reference-Cited by-同舟云学术

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Room-Temperature Preparation of High-Transparency Low-Resistivity ITO Films by Ion Beam Sputtering

Published:2010-07-27 Issue:10 Volume:39 Page:2352-2358
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Shen Jung-Hsiung,Yeh Sung-Wei,Gan Dershin,Yang Koho,Huang Hsing-Lu,Mao Shih-Wei

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-010-1328-8.pdf

Reference32 articles.

1. D.S. Gingley and C. Bright, MRS Bull. 25, 15 (2000).

2. I. Hamberg and C.G. Granqvist, J. Appl. Phys. 60, R123 (1986).

3. M.A. Martínez, M.T. Gutiérrez, and C. Maffiotte, Surf. Coat. Technol. 110, 68 (1998).

4. T. Minami, H. Sato, H. Nanto, and S. Takata, Thin Solid Films 176, 277 (1989).

5. K. Zhang, F. Zhu, C.H.A. Huan, and A.T.S. Wee, Thin Solid Films 376, 255 (2000).

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