Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature-Reference-Cited by-同舟云学术

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Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature

Published:2000-11 Issue:1-2 Volume:376 Page:255-263
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Zhang Keran,Zhu Furong,Huan C.H.A,Wee A.T.S

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference42 articles.

1. Transparent conductors—A status review

2. Evaporated Sn‐doped In2O3films: Basic optical properties and applications to energy‐efficient windows

3. Effect of process parameters on the characteristics of indium tin oxide thin film for flat panel display application

4. Indium tin oxide overlayered waveguides for sensor applications

5. Indium–tin oxide treatments for single- and double-layer polymeric light-emitting diodes: The relation between the anode physical, chemical, and morphological properties and the device performance

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