Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition
Author:
Affiliation:
1. Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, 04318 Leipzig, Germany
2. Applied Materials GmbH & Co. KG, Siemensstraße 100, 63755 Alzenau, Germany
3. J. A. Woollam Co. Inc., 645 M Street, Lincoln, Nebraska 68508
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://avs.scitation.org/doi/pdf/10.1116/6.0000917
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Annealing-free fabrication of high-quality indium tin oxide films for free-carrier-based hybrid metal–semiconductor nanophotonics;Scientific Reports;2023-10-28
2. Annealing-free fabrication of high-quality indium tin oxide films for free-carrier-based hybrid metal-semiconductor nanophotonics;2023-08-18
3. High quality optical Indium Tin Oxide (ITO) layers deposited by ion beam sputtering (IBS);Oxide-based Materials and Devices XIV;2023-03-16
4. Anisotropic optical properties of indium tin oxide thin films prepared by ion beam sputtering under oblique angle deposition;Applied Surface Science;2022-09
5. Properties of gallium oxide thin films grown by ion beam sputter deposition at room temperature;Journal of Vacuum Science & Technology A;2022-05
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