Wide-view-angle λ/4 plates for diagnosing 193-nm lithography tools-Reference-Cited by-同舟云学术

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Wide-view-angle λ/4 plates for diagnosing 193-nm lithography tools

Published:2009-03 Issue:2 Volume:16 Page:188-191
ISSN:1340-6000
Container-title:Optical Review
language:en
Short-container-title:OPT REV

Author:

Furutono Yohko,Nomura Hiroshi

Publisher

Springer Science and Business Media LLC

Subject

Atomic and Molecular Physics, and Optics

Link

http://link.springer.com/content/pdf/10.1007/s10043-009-0034-3.pdf

Reference3 articles.

1. T. Higashiki: Hikari Risogurafi Gijutu (Optical Lithography Technology) (ED Research, Tokyo, 2002) p. 17 [in Japanese].

2. H. Nomura: Dr. Thesis, School of Engineering, Tohoku University, Sendai (2007).

3. H. Nomura and Y. Furutono: Microelectron. Eng. 85 (2007) 1671.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wide field-of-view angle linear retarder with an ultra-flat retardance response;Optics Letters;2019-06-07

2. Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system;SPIE Proceedings;2016-03-15

3. Optimized imaging polarimeter for measuring polarization properties of hyper number aperture lithography tools;SPIE Proceedings;2014-09-18

4. Analysis and optimization approaches for wide-viewing-angle λ/4 plate in polarimetry for immersion lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-01

5. Polarimetric diagnosis of 193-nm lithography equipment using a mask with newly developed polarization optical elements;Thin Solid Films;2011-02

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