Optimized imaging polarimeter for measuring polarization properties of hyper number aperture lithography tools

Author:

Li Lei,Li Yanqiu,Chi Quan,Liu Ke,Zhang Xuebing,Li Jianhui

Publisher

SPIE

Reference13 articles.

1. Polarization effects associated with hyper-numerical-aperture lithography;Flagello,2005

2. Development of polarized-light illuminator and its impact;Nishinaga,2005

3. Wide-view-angle λ/4 plates for diagnosing 193-nm lithography tools

4. Analysis and optimization approaches for wide-viewing-angle λ/4 plate in polarimetry for immersion lithography

5. PSM Polarimetry: Monitoring polarization at 193nm high-NA and immersion with phase shifting masks;McIntyre,2005

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