Polarimetric diagnosis of 193-nm lithography equipment using a mask with newly developed polarization optical elements-Reference-Cited by-同舟云学术

Polarimetric diagnosis of 193-nm lithography equipment using a mask with newly developed polarization optical elements

Published:2011-02 Issue:9 Volume:519 Page:2688-2693
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Nomura Hiroshi

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. T. Fujii, K. Suzuki, Y. Mizuno, N. Kita: A. Yen, R. L. Engelstad (Eds.), Microlithography, San Jose, California, U.S.A., February 19–24, 2006, Proceedings of SPIE 6152 (2006) 615237.

2. H. Nomura, Y. Furutono: B. Zhou, B. Culshaw (Eds.), Photonics Asia, Beijing, China, November 11–15, 2007, Proceedings of SPIE 6834 (2007) 683408.

3. H. Nomura, Y. Furutono: R. L. Engelstad, C. J. Progler (Eds.), Advanced Lithography, San Jose, California, U.S.A., February 24–29, 2008, Proceedings of SPIE 6924 (2008) 69241T.

4. Wide-view-angle λ/4 plates for diagnosing 193-nm lithography tools

5. H. Nomura, I. Higashikawa: A. C. Chen, W.-S. Han, B. Lin, A. Yen (Eds.), Lithography Asia, Taipei, Taiwan, November 18–19, 2009, Proceedings of SPIE 7520 (2009) 752012.

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