Coherent Lithography with Tabletop Soft X-Ray Lasers: Latest Achievements and Prospects
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Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-319-73025-7_53
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3. Solak, H.H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B.H., Yang, X.M., Nealey, P.: Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography. Appl. Phys. Lett. 75, 2328–2330 (1999)
4. Wachulak, P.W., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C.: Nanopatterning in a compact setup using table top extreme ultraviolet lasers. Opto-Electron. Rev. 16, 444–450 (2008)
5. Wachulak, P.W., Urbanski, L., Capeluto, M.G., Hill, D., Rockward, W.S., Iemmi, C., Anderson, E.H., Menoni, C.S., Rocca, J.J., Marconi, M.C.: New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers. J. Micro-Nanolithogr. MEMS MOEMS 8, 021206 (2009)
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