Abstract
Abstract
A low-cost fabrication method for high aspect ratio nano-channels is proposed in this paper. The near-field exposure principle based on Fresnel diffraction was analyzed and the silicon nano-mold with the height of 962 ± 9 nm and width of 332 ± 12 nm was produced. Furthermore, the applicable demolding conditions for high aspect ratio nanoimprinting were studied, and the SU-8 nano-channels with the height of 947 ± 17 nm and width of 336 ± 13 nm were fabricated.
Funder
State Key Laboratory of Electrical Insulation and Power Equipment
State Key Laboratory of Refractories and Metallurgy
Basic Research Program of Shanxi for Youths
National Natural Science Foundation of China
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials