Plasma-enhanced chemical vapour deposition of silicon nitride from SiCl4, nitrogen and hydrogen on hard metals-Reference-Cited by-同舟云学术

Plasma-enhanced chemical vapour deposition of silicon nitride from SiCl4, nitrogen and hydrogen on hard metals

Published:1991-02 Issue:3 Volume:26 Page:782-786
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Endler I.,Leonhardt A.,Schönherr M.,Wolf E.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF03163522.pdf

Reference13 articles.

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4. K KIJIMA, N. SETAKA and H. TANAKA,J. Crystal Growth 24/25 (1974) 183.

5. W. SCHINTLMEISTER, W. WALLGRAM and K. GIGL, in “Proceedings of the 11th International Plansee Seminar 1985”, Reutte, Tirol, Austria, 1985, edited by H. Bildstein, H. M. Ortner (Metallwerk Plansee, GMBH, 1985), Vol. 2, p.299.

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