Physical properties of dual ion beam deposited (B0.5−xSix)N0.5 films-Reference-Cited by-同舟云学术

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Physical properties of dual ion beam deposited (B0.5−xSix)N0.5 films

Published:1997-07 Issue:4 Volume:15 Page:2297-2306
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Zhao X.-A.,Ong C. W.,Chan K. F.,Ng Y. M.,Tsang Y. C.,Choy C. L.,Chan P. W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580738

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Doping and electrical properties of cubic boron nitride thin films: A critical review;Thin Solid Films;2013-10

2. Development of a new generation of amorphous hard coatings based on the Si–B–C–N–O system for applications in extreme conditions;Surface and Coatings Technology;2013-05

3. Electrical transport properties of the Si-doped cubic boron nitride thin films prepared by in situ cosputtering;Journal of Applied Physics;2011-01-15

4. Effects of silicon incorporation on composition, structure and electric conductivity of cubic boron nitride thin films;Diamond and Related Materials;2010-11

5. Increase in Adhesion Strength and Thickness of Cubic Boron Nitride Thin Films by Silicon Addition;Journal of the Japan Institute of Metals;2010

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