Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition-Reference-Cited by-同舟云学术

Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition

Published:2003-08 Issue:3-4 Volume:77 Page:433-439
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl Phys A

Author:

Goh Y.W.,Lu Y.F.,Ren Z.M.,Chong T.C.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-002-1452-2.pdf

Reference25 articles.

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4. H. Morkoc, S. Strite: J. Vac. Sci. Technol. B 10, 1237 (1992)

5. M. Akiyama, K. Konaka, K. Shobu, T. Watanabe: J. Ceram. Soc. Jpn. 103, 974 (1995)

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