SiO2-like film deposited by plasma polymerization of HMDSO + O2 using repetitive high voltage pulses
Author:
Publisher
Springer Science and Business Media LLC
Subject
Colloid and Surface Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,General Chemistry
Link
https://link.springer.com/content/pdf/10.1007/s11998-020-00369-6.pdf
Reference39 articles.
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3. Fracassi, F et al., “Application of Plasma Deposited Organosilicon Thin Films for the Corrosion Protection of Metals.” Surf. Coatings Technol., 174–175, 107–111 (2003).
4. Borvon, G, Goullet, A, Granier, A, Turban, G, “ Analysis of Low-k Organosilicon and Low-Density Silica Films Deposited in HMDSO Plasmas.” Plasmas Polym., 7, 341–352 (2002).
5. Saloum, S, Naddaf, M, Alkhaled, B, “Properties of Thin Films Deposited from HMDSO/O2 Induced Remote Plasma: Effect of Oxygen Fraction.” Vacuum, 82, 742–747 (2008).
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