Properties of thin films deposited from HMDSO/O2 induced remote plasma: Effect of oxygen fraction
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference35 articles.
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4. Fourier transform infrared spectroscopy study of molecular structure formation in thin films during hexamethyldisiloxane decomposition in low pressure rf discharge
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