Improving the gas barrier property of SiOx:C thin films deposited by RF magnetron sputtering-Reference-Cited by-同舟云学术

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Improving the gas barrier property of SiOx:C thin films deposited by RF magnetron sputtering

Published:2015-10 Issue: Volume:279 Page:161-165
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kuo Chien-Cheng^ORCID,Li Meng-Chi,Liao Shih-Fang,Wei Chin-Lun,Wei Hung-Sen,Lee Cheng-Chung

Funder

Ministry of Science and Technology

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference34 articles.

1. New developments in transparent barrier coatings;Krug,1993

2. Transparent glass barrier coatings for flexible film packaging;Chahroudi,1991

3. Transparent Barriers for Food Packaging;Krug,1990

4. Visual system-response functions and estimating reflectance;van. Trigt;J. Vac. Sci. Technol. A,1997

5. Silicon (Si);Edwards,1985

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design of organic/inorganic multilayer water vapor barrier thin films deposited via plasma polymerization for encapsulation;Thin Solid Films;2023-02

2. SiO2-like film deposited by plasma polymerization of HMDSO + O2 using repetitive high voltage pulses;Journal of Coatings Technology and Research;2020-07-15

3. Effects of radio frequency power and gas ratio on barrier properties of SiOxNy films deposited by inductively coupled plasma chemical vapor deposition;Thin Solid Films;2019-01

4. SiOx:C/SiO2-like gas barrier multilayer thin films deposited by radio frequency magnetron sputtering-based plasma polymerization system;Thin Solid Films;2018-08

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