Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference50 articles.
1. R. Barni, S. Zanini, C. Riccardi, Characterization of the chemical kinetics in an O2/HMDSO RF plasma for material processing. Adv. Phys. Chem. 2012, 205380 (2012)
2. K. Gotoh, E. Shohbuke, Y. Kobayashi, H. Yamada, Wettability control of PET surface by plasma-induced polymer film deposition and plasma/UV oxidation in ambient air. Colloids Surfaces A (2018). https://doi.org/10.1016/j.colsurfa.2018.07.033
3. E. Grimoldi, S. Zanini, R.A. Siliprandi, C. Riccardi, AFM and contact angle investigation of growth and structure of pp-HMDSO thin films. Eur. Phys. J. D 54, 165–172 (2009)
4. H.L. Chen, L.A. Wang, Hexamethyldisiloxane film as the bottom antireflection coating layer for ArF excimer lithography. App. Opt. 38, 4885–4890 (1999)
5. M.L.P. da Silva, I.H. Tan, A.P. NascimentoFilho, E. Galeazzo, D.P. Jesus, Use of plasma polymerized highly hydrophobic hexamethyldissilazane (HMDS) films for sensor development. Sens. Actuators B 91, 362e369 (2003)
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