Author:
Lin Laicun,Jing Xiangmeng,Liu Fengman,Yin Wen,Yu Daquan,Cao Liqiang
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
8 articles.
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1. Machining technologies and structural models of microfluidic devices;Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science;2024-03-23
2. Selective Laser-induced Etching of Borosilicate Glass In Hydrofluoric Acid;2023 24th International Conference on Electronic Packaging Technology (ICEPT);2023-08-08
3. The Influences of Non-Volatile Surface Compound Layer on the Dry Etching of Borosilicate Glass;Journal of Microelectromechanical Systems;2021-10
4. Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask;Journal of Vacuum Science & Technology A;2021-07
5. The Influences of Non-Volatile Surface Compound Layer on the Plasma Etching of Borosilicate Glass;2021 21st International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers);2021-06-20