Building of super high-efficiency processing technology based on innovative concept (Establishment of effective polishing process of SiC substrate using Dilatancy pad tool with bowl feed method)-Reference-Cited by-同舟云学术

Building of super high-efficiency processing technology based on innovative concept (Establishment of effective polishing process of SiC substrate using Dilatancy pad tool with bowl feed method)

Published:2015 Issue:824 Volume:81 Page:14-00618-14-00618
ISSN:2187-9761
Container-title:Transactions of the JSME (in Japanese)
language:en
Short-container-title:

Author:

K. DOI Toshiro¹¹,SESHIMO Kiyoshi¹,YAMAZAKI Tsutomu¹,OHTSUBO Masanori¹,NISHIZAWA Hideaki¹,MURAKAMI Sachi¹,ICHIKAWA Daizo²,NAKAMURA Yoshio²,MIYASHITA Tadakazu²,KAWAMURA Yoshihide³,TAKAGI Masataka³,KASHIWADA Hiroshi³,AIDA Hideo⁴¹

Affiliation:

1. KASTEC Kyushu University

2. Fujikoshi Machinery Corp.

3. Fujibo Ehime Co., LTD.

4. Namiki Precision Jewel Co., LTD.

Publisher

Japan Society of Mechanical Engineers

Link

https://www.jstage.jst.go.jp/article/transjsme/81/824/81_14-00618/_pdf

Reference14 articles.

1. Doi, T. K., Seshimo, K. and Yamazaki, T., Development of a New Concept Dilatancy Pads and Smart CMP System, with Applications to Hard-to-process Substrates, 129^th/130^th Proceeding of Meeting of Planarization CMP Committee (2013), pp.37-44 (in Japanese).

2. Doi, T. K., Open innovation for a brighter future, NATUREJOBS (2013), p.13.

3. Doi, T. K., Yamazaki, T., Seshimo, K. and Ichikawa, D., Development of the polishing process technology of the crystal substrate for green devices (The 1st Report), JSPE Proceedings (2013b), pp. 631-632 (in Japanese).

4. Doi, T. K., The disturbance-free processing by colloidal silica of a single crystal sapphire, Journal of the Japan Society of Precision Engineering, Vol.47, No.12 (1981), pp.1458-1463.

5. Doi, T. K., The crystal material polishing for electronic components, and its application and the research, doctoral dissertation in Univ. of Tokyo (1984).

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