Three-Dimensional Nanofabrication Utilizing Selective Etching of Silicon Induced by Focused Ion Beam Irradiation-Reference-Cited by-同舟云学术

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Three-Dimensional Nanofabrication Utilizing Selective Etching of Silicon Induced by Focused Ion Beam Irradiation

Published:2006 Issue:2 Volume:49 Page:583-589
ISSN:1344-7653
Container-title:JSME International Journal Series C
language:en
Short-container-title:JSME Int. J., Ser. C

Author:

KAWASEGI Noritaka¹,MORITA Noboru²,YAMADA Shigeru²,TAKANO Noboru²,OYAMA Tatsuo²,ASHIDA Kiwamu³,TANIGUCHI Jun⁴,MIYAMOTO Iwao⁴

Affiliation:

1. Graduate School of Science and Engineering, University of Toyama

2. Department of Mechanical and Intellectual Systems Engineering, University of Toyama

3. Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology

4. Department of Applied Electronics, Tokyo University of Science

Publisher

Japan Society of Mechanical Engineers

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Link

http://www.jstage.jst.go.jp/article/jsmec/49/2/49_2_583/_pdf

Reference16 articles.

1. High resolution patterning of silicon by selective gallium doping

2. Localized fabrication of Si nanostructures by focused ion beam implantation

3. Thin oxides on passivated silicon irradiated by focused ion beams

4. 3D Micro-Fabrication using Combination Technique of Nano-Scale Processing and Chemical Etching (2nd Report, Possibility of 3D Micro-Fabrication using Focused Ion Beam Process)

5. Writing FIB implantation and subsequent anisotropic wet chemical etching for fabrication of 3D structures in silicon

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1. Helium Ion‐Assisted Wet Etching of Silicon Carbide with Extremely Low Roughness for High‐Quality Nanofabrication;Small Methods;2024-01-07

2. Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching;Nanomaterials;2022-09-20

3. Ion Beam Machining;Micro/Nano Technologies;2018

4. Ion Beam Machining;Toxinology;2018

5. Ion Beam Machining;Toxinology;2018

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