Ion Beam Machining
Author:
Kawasegi Noritaka
Publisher
Springer Netherlands
Reference72 articles.
1. Awazu K, Ishii S, Shima K, Roorda S, Brebner JL (2000) Structure of latent tracks created by swift heavy-ion bombardment of amorphous SiO2. Phys Rev B 62:3689–3698
2. Baba A, Bai D, Sadoh T, Kenjo A, Nakashima H, Mori H, Tsurushima T (1997) Behavior of radiation-induced defects and amorphization in silicon crystal. Nucl Instrum Methods Phys Res Sect B 121:299–301
3. Bai G, Nicolet MA (1991) Defects production and annealing in self-implanted Si. J Appl Phys 70:649–655
4. Baranova EC, Gusev VM, Martynenko YV, Starinin CV, Haibullin IB (1973) On silicon amorphization during different mass ion implantation. Radiat Eff 18:21–26
5. Battaglia A, Priolo F, Rimini E (1990) Ion-induced annealing and amorphization of isolated damage clusters in Si. Appl Phys Lett 56:2622–2624