Writing FIB implantation and subsequent anisotropic wet chemical etching for fabrication of 3D structures in silicon-Reference-Cited by-同舟云学术

Writing FIB implantation and subsequent anisotropic wet chemical etching for fabrication of 3D structures in silicon

Published:1997-06 Issue:1-3 Volume:61 Page:369-373
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Schmidt B.,Bischoff L.,Teichert J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Silicon as a mechanical material;Peterson,1982

2. Micromachining of silicon mechanical structure;Kaminsky;J. Vac. Sci. Technol.,1985

3. Semiconductor Silicon 1973;Price,1973

4. Focused ion beam microlithography using an etch-stop process in gallium doped solicon;La Marche;J. Vac. Sci. Technol.,1983

5. Characteristics of gas-assisted focused ion beam etching;Young;J. Vac. Sci. Technol.,1993

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