Failure Modes of Flip Chip Solder Joints Under High Electric Current Density

Author:

Basaran C.1,Ye H.1,Hopkins D. C.1,Frear D.2,Lin J. K.2

Affiliation:

1. Electronic Packaging Laboratory, University at Buffalo, SUNY, Buffalo, New York

2. Freescale semiconductor Inc., Tempe, Arizona

Abstract

The failure modes of flip chip solder joints under high electrical current density are studied experimentally. Three different failure modes are reported. Only one of the failure modes is caused by the combined effect of electromigration and thermomigration, where void nucleation and growth contribute to the ultimate failure of the module. The Ni under bump metallization–solder joint interface is found to be the favorite site for void nucleation and growth. The effect of pre-existing voids on the failure mechanism of a solder joint is also investigated

Publisher

ASME International

Subject

Electrical and Electronic Engineering,Computer Science Applications,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Electromigration of Eutectic SnPb Solder Interconnects for Flip Chip Technology;Lee;J. Appl. Phys.

2. Electromigration of Eutectic SnPb and SnAg3.8Cu0.7 Flip Chip Solder Bumps and Under-bump Metallization;Lee;J. Appl. Phys.

3. Experiment Study on Reliability of Solder Joints Under Electrical Stressing-Nano-indentation, Atomic Flux Measurement;Ye

4. Failure Modes and FEM Analysis of Power Electronic Packaging;Ye;Finite Elem. Anal. Design

5. Thermomigration in Pb-Sn Solder Joints Under Joule Heating during Electric Current Stressing;Ye;Appl. Phys. Lett.

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