Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering
Author:
Affiliation:
1. Mineral Resources Research Division, Korea Institute of Geoscience & Mineral Resources
2. Department of Physics, College of Sciences, Cantho University
Publisher
Japan Institute of Metals
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.jstage.jst.go.jp/article/matertrans/51/1/51_M2009183/_pdf
Reference19 articles.
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3. 3) R. W. Vook: Thin solid film 305 (1997) 286–291.
4. 4) S. Dhingra, R. Sharma and P. J. George: Solid-State Electron. 43 (1999) 2231–2234.
5. 5) K.-Y. Chan and B.-S. Teo: Microelectron. J. 38 (2007) 60–62.
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