Fabrication of tantalum silicate films with low TCR and low resistivity by magnetron sputtering-Reference-Cited by-同舟云学术

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Fabrication of tantalum silicate films with low TCR and low resistivity by magnetron sputtering

Published:2024-08 Issue: Volume:226 Page:113330
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Chen Cheng-Lung,Huang Cheng,Chen Sheng-Chi^ORCID,Liu Yen-Chen,Chuang Min-Chen,Wen Chao-Kuang,Huang Wei-Sheng,Yang Wen-Sheng,Chen Yang-Yuan

Funder

Ming Chi University of Technology

National Science and Technology Council

Publisher

Elsevier BV

Reference58 articles.

1. Quality capability assessment for thin-film chip resistor;Chen;IEEE Access,2019

2. Process optimization of integrated SiCr thin-film resistor for high-performance analog circuits;Kwon;IEEE Trans. Electron. Dev.,2014

3. Zero temperature coefficient of resistance in back-end-of-the-line compatible titanium aluminum nitride films by atomic layer deposition;Krylov;Appl. Phys. Lett.,2020

4. Analog circuit design in nanoscale CMOS technologies;Lewyn;Proceedings of the IEEE,2009

5. Thin-film MEMS resistors with enhanced lifetime for thermal inkjet;Bar-Levav;Micromachines,2020

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1. Temperature-based energy changes in gold nanowire sensors for flow rate detection and failure prediction;Vacuum;2024-11

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